ASML company will start supplying EUV-scanners for 10-nm-making in mid-2015

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POSTER: computer news   ||   ASML COMPANY WILL START SUPPLYING EUV-SCANNERS FOR 10-NM-MAKING IN MID-2015	DATE:2014-10-16
This year, when discussing the prospects of the market of desktop graphics cards on the forum and on other thematic resources often raised the issue of 20-nm GPUs.  Translation of the GPU on the new process technology enables relatively quickly receive the product with the best performance. After all, the creation of new and better architecture should be significantly longer.   ASML company , whose scanners are used for the processing of semiconductor wafers, is firmly convinced that the technical process 16 and 14 nm will be massive next year, rather than 2016 so that we have a chance to see 16 / 14-nm GPU rather quickly - as early as next year. In general, the management of ASML company  revelations were confined to such an event, as the report on the work in the third quarter of calendar 2014.  As always, a developer and manufacturer of equipment for semiconductor lithography shared his plans for the delivery of advanced scanners.  It is reported that the company's customers have received six new machines NXE: 3300, designed to work with the source of EUV-radiation: one was shipped last year, five - in the present.  From the middle of next year, will begin shipping more advanced EUV-scanner NXE: 3350, which ordered six pieces, and by the time the three scanner NXE: 3300 will be upgraded to the level of NXE: 3350. Note scanners NXE: 3300 bear a radiation source capable of generating EUV-stream, suitable for processing 200 plates during the day.  Field tests have shown that the replacement of radiation sources for new and more powerful gives an output in excess of 500 plates per day (for example, an experiment set in at IBM, although it has caused criticism in its purity).  Until the end, ASML expects to upgrade all set and new scanners NXE: 3300, allowing them to handle more than 500 plates for 24 hours.  To begin commercial use of EUV-lithography needs to handle more than 1,500 plates per day.  This level of performance  ASML scanners will achieve in 2016. Another feature of the new scanners - NXE: 3350 - will be that with their help, you can start working with the 10-nm projection.  The first 10-nm pilot line will work in mid-2015.  Mass production of 10-nm production company ASML expects to close by the end of 2016.  According to ASML, the transition to EUV-scanners greatly simplify the production of semiconductors with advanced process technologies that increase the production yield and reduce the cost of making.   Related Products :

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